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Ecr Plasma Oxidation of Amorphous Silicon for Improvement of The Interface State in a Poly Silicon Thin Film Transistor
Ihn, Tae-Hyung, Lee, Seok-Woon, Lee, Byung-Il, Jeon, Yoo-Chan, Joo, Seung-KiVolume:
424
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-424-189
Date:
January, 1996
File:
PDF, 298 KB
english, 1996