Chemical Vapor Deposition of Copper Films: Influence Of The Seeding Layers
Yoon, Kyoung-Ryul, Kim, Seok, Choi, Doo-Jin, Kim, Ki-Hwan, Koh, Seok-KeunVolume:
427
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-427-225
Date:
January, 1996
File:
PDF, 1.34 MB
english, 1996