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Evaluation of Microstructure Evolution of Al-1%SI-0.5%CU Thin Film Induced By Post Deposition Processing
Zaccherini, C., Bacchetta, M., Pavia, G., Riva, L., Savoia, C.Volume:
428
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-428-273
Date:
January, 1996
File:
PDF, 317 KB
english, 1996