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Boron Transient Enhanced Diffusion in Heavily Phosphorus Doped Silicon
Huang, M. B., Myler, U., Simpson, T. W., Simpson, P. J., Mitchell, I. V.Volume:
438
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-438-101
Date:
January, 1996
File:
PDF, 358 KB
english, 1996