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N-Type Doping by Plasma Ion Implantation Using a PH3 SDS System
Qin, Shu, Zhou, Yuanzhong, Warner, Keith, Chan, Chung, Shao, Jiqun, Denholm, StuartVolume:
438
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-438-351
Date:
January, 1996
File:
PDF, 330 KB
english, 1996