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Mask-Edge Distributions Produced by 80 KeV As+ Ion Implantation Into Si
Danailov, D., Karpuzov, D., Almazouzi, A., Almeida, P.De, Victoria, M.Volume:
439
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-439-119
Date:
January, 1996
File:
PDF, 345 KB
english, 1996