The Thermal Stability of Fluorine Doped Silicon Oxide Films...

MRS Proceedings 1996 / 1 Vol. 443

The Thermal Stability of Fluorine Doped Silicon Oxide Films Formed by Ecrcvd With SiF4 and O2 Gases

Lee, Seoghyeong, Yoo, Jae-Yoon, Park, Jong-Wan
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Volume:
443
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-443-119
Date:
January, 1996
File:
PDF, 2.47 MB
english, 1996
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