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The Applicability of Fluorinated Silicon Nitride Film As Bottom Antireflective Layer In Deep Ultraviolet Lithography
Byung-Hyuk, Jun, Sang-Soo, Han, Dong-Wan, Kim, Ho-Young, Kang, Young-Bum, Koh, Byeong-Soo, Bae, Kwangsoo, NoVolume:
446
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-446-115
Date:
January, 1996
File:
PDF, 2.12 MB
english, 1996