Plasma Etching of Silicon Dioxide and Silicon Nitride with Non-Perfluorocompound Chemistries: Trifluoroacetic Anhydride and Iodofluorocarbons
Karecki, Simon M., Pruette, Laura C., Reif, L. RafaelVolume:
447
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-447-67
Date:
January, 1996
File:
PDF, 1.05 MB
english, 1996