Suppression of Surface SiO2 Layer and Solid Phase Epitaxy...

MRS Proceedings 1996 / 1 Vol. 448

Suppression of Surface SiO2 Layer and Solid Phase Epitaxy of Amorphously Deposited Si Films using Heating-Up Under Si2H6 Environment

Choe, Tae-Hee, Kim, Se-June, Choi, Woon, Kim, Hyoung-June
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Volume:
448
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-448-345
Date:
January, 1996
File:
PDF, 1.76 MB
english, 1996
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