Deposition of AlN on WS2 (0001) Substrate by Atomic Layer...

Deposition of AlN on WS2 (0001) Substrate by Atomic Layer Growth Process

Chung, J-W., Ohuchi, F.S.
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Volume:
449
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-449-379
Date:
January, 1996
File:
PDF, 402 KB
english, 1996
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