Electrical Characterization of Ion Imiplanted, Thermally...

MRS Proceedings 1985 / 1 Vol. 45

Electrical Characterization of Ion Imiplanted, Thermally Annealed TiN Films Acting as Diffusion Barriers on Shallow Junction Silicon Devices

Armigliato, A., Finetti, M., Gabilli, E., Guerri, S., Ostoja, P., Sabato, G., Scorzoni, A.
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Volume:
45
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-45-183
Date:
January, 1985
File:
PDF, 314 KB
english, 1985
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