Low-Temperature Formation of Device-Quality Polysilicon Films by cat-CVD Method
Matsumura, Hideki, Heya, Akira, Iizuka, Ritsuko, Izumi, Akira, He, An-Qiang, Otsuka, NobuoVolume:
452
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-452-983
Date:
January, 1996
File:
PDF, 830 KB
english, 1996