Comparison of SiH4 and Si2H6 RTCVD Kinetics using in-situ...

MRS Proceedings 1997 / 1 Vol. 470

Comparison of SiH4 and Si2H6 RTCVD Kinetics using in-situ Spectroscopic Ellipsometry

Hu, Y. Z., Tay, S. P., Wasserman, Y., Zhao, C. Y., Irene, E. A.

How much do you like this book?

What’s the quality of the file?

Download the book for quality assessment

What’s the quality of the downloaded files?

Volume:

470

Language:

english

Journal:

MRS Proceedings

DOI:

10.1557/proc-470-115

Date:

January, 1997

File:

PDF, 822 KB

english, 1997

Conversion to is in progress

Conversion to is failed