Characterization of Oxide Etching and Wafer Cleaning using Vapor-Phase Anhydrous HF and Ozone
Froeschle, Barbara, Deutschmann, Lutz, Bauer, Anton J., Burte, Edmund P.Volume:
470
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-470-237
Date:
January, 1997
File:
PDF, 334 KB
english, 1997