Effect of Post Plasma Treatment on Reliability and Dielectric Properties of SiOF Films Deposited by ECRCVD With SiF4 and O2
Lee, Seoghyeong, Yoo, Jae-Yoon, Oh, Kyunghui, Park, Jong-WanVolume:
476
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-476-291
Date:
January, 1997
File:
PDF, 1.01 MB
english, 1997