Effect of Post Plasma Treatment on Reliability and...

Effect of Post Plasma Treatment on Reliability and Dielectric Properties of SiOF Films Deposited by ECRCVD With SiF4 and O2

Lee, Seoghyeong, Yoo, Jae-Yoon, Oh, Kyunghui, Park, Jong-Wan
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Volume:
476
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-476-291
Date:
January, 1997
File:
PDF, 1.01 MB
english, 1997
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