Surface Treatment with UV-Excited Radicals for Highly-Reliable Gate Dielectrics
Ito, Takashi, Sugino, Rinji, Nakanishi, Toshiro, Ohkubo, Satoshi, Tamura, Yasuyuki, Takasaki, KanetakeVolume:
477
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-477-71
Date:
January, 1997
File:
PDF, 2.58 MB
english, 1997