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Characterization of Erbium Doped SiO2 Layers Formed On Silicon By Spark Processing
John, John V. St., Coffer, Jeffery L., Rho, Young Gyu, Diehl, Patrick, Pinizzotto, Russell F., Culp, Thomas D., Bray, Kevin L.Volume:
486
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-486-281
Date:
January, 1997
File:
PDF, 1.03 MB
english, 1997