New Liquid Precursors for Chemical Vapor Deposition
Gordon, Roy G., Chen, Feng, Diceglie, Nicholas J., Kenigsberg, Amos, Liu, Xinye, Teff, Daniel J., Thornton, JohnVolume:
495
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-495-63
Date:
January, 1997
File:
PDF, 984 KB
english, 1997