Guide for Low-Temperature and High-Rate Deposition of...

MRS Proceedings 1998 / 1 Vol. 507

Guide for Low-Temperature and High-Rate Deposition of Device Quality Poly-Silicon Films By Cat-Cvd Method

Heya, Akira, Nakata, Kazuhisa, Izumi, Akira, Matsumura, Hideki
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Volume:
507
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-507-435
Date:
January, 1998
File:
PDF, 323 KB
english, 1998
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