Plasma Chemistry Study of Plasma Ion Implantation Doping for Cmos Devices
Qin, Shu, Zhou, Yuanzhong, Chan, ChungVolume:
510
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-510-239
Date:
January, 1998
File:
PDF, 397 KB
english, 1998