Plasma Chemistry Study of Plasma Ion Implantation Doping...

Plasma Chemistry Study of Plasma Ion Implantation Doping for Cmos Devices

Qin, Shu, Zhou, Yuanzhong, Chan, Chung
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Volume:
510
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-510-239
Date:
January, 1998
File:
PDF, 397 KB
english, 1998
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