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The Engineering of Silicon Wafer Material Properties Through Vacancy Concentration Profile Control and the Achievement of Ideal Oxygen Precipitation Behavior
Falster, R., Gambaro, D., Olmo, M., Cornara, M., Korb, H.Volume:
510
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-510-27
Date:
January, 1998
File:
PDF, 3.10 MB
english, 1998