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Reliability of Cu/WN thin Films Deposited on Low Dielectric Constant SiOF ILD
Lee, Seoghyeong, Kim, Dong Joon, Yang, Sung-Hoon, Park, Jeongwon, Sohn, Seil, Oh, Kyunghui, Kim, Yong-Tae, Park, Jong-WanVolume:
511
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-511-347
Date:
January, 1998
File:
PDF, 1.61 MB
english, 1998