Newly Developed Low-K and Low-Stress Fluorinated Silicon Oxide Utilizing Temperature-Difference Liquid-Phase Deposition Technology
Yeh, Ching-Fa, Lee, Yueh-Chuan, Lee, Su-ChenVolume:
511
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-511-57
Date:
January, 1998
File:
PDF, 246 KB
english, 1998