Low-Dielectric Constant SiO(F,C) Films for ULSI...

MRS Proceedings 1998 / 1 Vol. 511

Low-Dielectric Constant SiO(F,C) Films for ULSI Interconnections Prepared by CF4 Plasma Ion Implantation

Zhou, Yuanzhong, Qin, Shu, Chan, Chung, Chu, Paul K.
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Volume:
511
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-511-63
Date:
January, 1998
File:
PDF, 373 KB
english, 1998
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