Compound Formation And Silicon Behavior In Titanium And...

MRS Proceedings 1985 / 1 Vol. 54

Compound Formation And Silicon Behavior In Titanium And Tantalum Layered Aluminum Films

Shen, B. W., Anthony, J. M., Chang, P-H., Keenan, J., Matyi, R., Tsai, H. L.
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Volume:
54
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-54-103
Date:
January, 1985
File:
PDF, 1.48 MB
english, 1985
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