Preparation of SiC Thin Film Using Organosilicon by Remote...

MRS Proceedings 1998 / 1 Vol. 544

Preparation of SiC Thin Film Using Organosilicon by Remote Plasma CVD Method

Xu, Ying-Yu, Muramatsu, Takahiro, Aoki, Toru, Nakanishi, Yoichiro, Hatanaka, Yoshinori
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Volume:
544
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-544-185
Date:
January, 1998
File:
PDF, 845 KB
english, 1998
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