Growth and Stress Characterization of LPCVD SiC Films Deposited on Bare, Carbonized and Oxidized Si(001) Substrates
Hurtós, E, Rodríguez-Viejo, J, Zekentess, K, Clavaguera-Mora, M. TVolume:
555
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-555-173
Date:
January, 1998
File:
PDF, 2.14 MB
english, 1998