The Influence of Ti Capping Layers on CoSi2 Formation in...

MRS Proceedings 1999 / 1 Vol. 564

The Influence of Ti Capping Layers on CoSi2 Formation in the Presence of Interfacial Oxide

Detavernier, C., Donaton, R. A., Maex, K., Jin, S., Bender, H., Van Meirhaeghe, R., Cardon, F.
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Volume:
564
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-564-139
Date:
January, 1999
File:
PDF, 1.53 MB
english, 1999
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