Chemical and Thermal Stability of Fluorinated Amorphous Carbon Films for Interlayer Dielectric Applications
Chang, J. P., Krautter, H. W., Zhu, W., Opila, R. L., Pai, C. S.Volume:
565
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-565-117
Date:
January, 1999
File:
PDF, 836 KB
english, 1999