Development of High Purity One Atm Ozone Source - Its...

MRS Proceedings 1999 / 1 Vol. 567

Development of High Purity One Atm Ozone Source - Its Application to Ultrathin SiO2 Film Formation on Si Substrate

Koike, Kunihiko, Inoue, Goichi, Ichimura, Shingo, Nakamura, Ken, Kurokawa, Akira, Nonaka, Hidehiko
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Volume:
567
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-567-121
Date:
January, 1999
File:
PDF, 806 KB
english, 1999
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