![](/img/cover-not-exists.png)
High-k Dielectrics and Dual Metal Gates: Integration Issues for New CMOS Materials
Claflin, B., Flock, K., Lucovsky, G.Volume:
567
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-567-603
Date:
January, 1999
File:
PDF, 344 KB
english, 1999