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Interfacial Properties of Si-Si3N4formed by Remote Plasma Enhanced Chemical Vapor Deposition
Misra, V., Lazar, H., Kulkami, M., Wang, Z., Lucovsky, G., Hauser, J.R.Volume:
567
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-567-89
Date:
January, 1999
File:
PDF, 1.21 MB
english, 1999