Development of Low Temperature Silicon Nitride and Silicon...

MRS Proceedings 1999 / 1 Vol. 573

Development of Low Temperature Silicon Nitride and Silicon Dioxide Films by Inductively-Coupled Plasma Chemical Vapor Deposition

Lee, J. W., Mackenzie, K. D., Johnson, D., Pearton, S. J., Ren, F., Sasserath, J. N.
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Volume:
573
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-573-69
Date:
January, 1999
File:
PDF, 1.74 MB
english, 1999
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