Process Improvements for Reductions in Total Charge and Interface Trap Densities of Thermally-Grown Sub-3.5nm-Thick Silicon Nitrides
Dang, Sanjit Singh, Takoudis, Christos G.Volume:
592
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-592-213
Date:
January, 1999
File:
PDF, 320 KB
english, 1999