Deposition and Characterization of Ultrathin Ta2O5 Layers...

MRS Proceedings 1999 / 1 Vol. 592

Deposition and Characterization of Ultrathin Ta2O5 Layers Deposited on Silicon From a Ta(OC2H5)5 Precursor

Chaneliere, C., Autran, J.L., Reynard, J.P., Michailos, J., Barla, K., Ushikawa, H., Hiroe, A., Shimomura, K., Kakimoto, A.
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Volume:
592
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-592-75
Date:
January, 1999
File:
PDF, 1.96 MB
english, 1999
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