Highly Reliable Thin Hafnium Oxide Gate Dielectric

MRS Proceedings 1999 / 1 Vol. 592

Kang, Laegu, Lee, Byoung-Hun, Qi, Wen-Jie, Jeon, Yong-Joo, Nieh, Renee, Gopalan, Sundar, Onishi, Katsunori, Lee, Jack C.

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Volume:

592

Language:

english

Journal:

MRS Proceedings

DOI:

10.1557/proc-592-81

Date:

January, 1999

File:

PDF, 792 KB

english, 1999

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