Ion Implantation and Misfit Dislocation Formation in P/P+Silicon
Feichtinger, Petra, Fukuto, Hiroaki, Sandhu, Rajinder, Poust, Benjamin, Goorsky, Mark S.Volume:
594
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-594-37
Date:
January, 1999
File:
PDF, 938 KB
english, 1999