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Anisotropic Plasma Etching of Barium-Strontium-Titanate Thin Films for 4 Gbit DRAM Devices
Schneider, Stefan, Kennard, Mark A., Waser, RaineVolume:
596
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-596-109
Date:
January, 1999
File:
PDF, 2.58 MB
english, 1999