Tunnel Type Magnetoresistance in Electron Beam Deposited...

Tunnel Type Magnetoresistance in Electron Beam Deposited Films of Compositions (Co0.5Fe0.5)x(Al2O3)(100-x) (7 ≤ x ≤ 52)

Khan, H.R., Vovk, A. Ya, Kravets, A.F., Shipil, O.V., Pogoriliy, A.N.
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Volume:
602
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-602-251
Date:
January, 1999
File:
PDF, 210 KB
english, 1999
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