Properties of Low Residual Stress Silicon Oxynitrides Used...

MRS Proceedings 1999 / 1 Vol. 605

Properties of Low Residual Stress Silicon Oxynitrides Used as a Sacrificial Layer

Habermehl, S., Glenzinski, A. K., Halliburton, W. M., Sniegowski, J. J.
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Volume:
605
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-605-49
Date:
January, 1999
File:
PDF, 346 KB
english, 1999
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