Volatile Liquid Precursors for the Chemical Vapor Deposition (CVD) of Thin Films Containing Alkali Metals
Broomhall-Dillard, Randy N. R., Gordon, Roy G., Wagner, Valerie A.Volume:
606
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-606-139
Date:
January, 1999
File:
PDF, 1.05 MB
english, 1999