Silicon Cleaning Methods Compared at Metal Concentrations Below 1E10 atoms/cm2
Ilardi, Joseph, Saraswati, Rajananda, Schwartzkopf, GeorgeVolume:
606
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-606-245
Date:
January, 1999
File:
PDF, 719 KB
english, 1999