![](/img/cover-not-exists.png)
Comparison of low temperature growth of Si thin films on amorphous substrates by MBE and PECVD methods
Selvan, J. A. Anna, Grützmacher, D., Müller, E., Rebien, M., Kummer, M., Känel, H. von, Gobrecht, J.Volume:
609
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-609-a19.4
Date:
January, 2000
File:
PDF, 1.52 MB
english, 2000