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Boron Diffusion Mechanism in Silicon Oxide Using AB Initio Methods
Zubkov, V., Senosiain, J. P., Aronowitz, S., Sukharev, V., Musgrave, C. B.Volume:
610
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-610-b5.11
Date:
January, 2000
File:
PDF, 64 KB
english, 2000