In-situ Growth and Growth Kinetics of Epitaxial (100) CoSi2 Layer on (100) Si by Reactive Chemical Vapor Deposition
Rhee, Hwa Sung, Lee, Heui Seung, Park, Jong Ho, Ahn, Byung TaeVolume:
611
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-611-c10.3.1
Date:
January, 2000
File:
PDF, 643 KB
english, 2000