Hot Wall Isothermal RTP for Gate Oxide Growth and...

MRS Proceedings 2000 / 1 Vol. 611

Hot Wall Isothermal RTP for Gate Oxide Growth and Nitridation

Laser, Allan, Ratliff, Christopher, Yao, Jack, Bailey, Jeff, Passefort, Jean-Claude, Vaughan, Eric, Page, Larry
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Volume:
611
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-611-c7.7.1
Date:
January, 2000
File:
PDF, 82 KB
english, 2000
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