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Effects of Electrode Spacing on Reactive Ion Etching of 4H-SiC
Bonds, Janna R., Carter, Geoff E., Casady, Jeffrey B., Scofield, James D.Volume:
622
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-622-t8.8.1
Date:
January, 2000
File:
PDF, 84 KB
english, 2000