High Resolution Resists for Next Generation Lithography: The Nanocomposite Approach
Gonsalves, Kenneth E., Wu, Hengpeng, Hu, Yongqi, Merhari, LhadiVolume:
636
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-636-d6.5.1
Date:
January, 2000
File:
PDF, 2.82 MB
english, 2000