Fabrication of GaN layer with Low Dislocation Density using Facet controlled ELO technique
Miyake, H., Mizutani, H., Hiramatsu, K., Iyechika, Y., Honda, Y., Maeda, T.Volume:
639
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-639-g5.3
Date:
January, 2000
File:
PDF, 871 KB
english, 2000